Rhallabi, A: search on Z-Library

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1

Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties

Pateau, Amand, Rhallabi, Ahmed, Fernandez, Marie-Claude, Boufnichel, Mohamed, Roqueta, Fabrice

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 1.22 MB

english, 2014

2

Multiscale approach for simulation of silicon etching using SF 6 /C 4 F 8 Bosch process

Le Dain, Guillaume, Rhallabi, Ahmed, Fernandez, Marie Claude, Boufnichel, Mohamed, Roqueta, Fabrice

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2017

Language:

english

File:

PDF, 2.36 MB

english, 2017

3

Modeling of ICP C4F8 plasma : effects of high RF power on the plasma electrical properties

Le Dain, Guillaume, Rhallabi, Ahmed, Girard, Aurelie, Cardinaud, Christophe, Roqueta, Fabrice, Boufnichel, Mohamed

Journal:

Plasma Sources Science and Technology

Year:

2019

File:

PDF, 1.70 MB

2019

4

A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis

Siamak Salimy, Antoine Goullet, Ahmed Rhallabi, Fatiha Challali, Serge Toutain, Jean Claude Saubat

Journal:

Solid-State Electronics

Year:

2011

Language:

english

File:

PDF, 1.04 MB

english, 2011

5

Estimation of the TEOS dissociation coefficient by electron impact

Vallée, C., Rhallabi, A., Granier, A., Goullet, A., Turban, G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 550 KB

english, 2000

6

[IEEE 2009 IEEE MTT-S International Microwave Symposium Digest (MTT) - Boston, MA, USA (2009.06.7-2009.06.12)] 2009 IEEE MTT-S International Microwave Symposium Digest - An enhanced physical and scalable lumped model of RF CMOS spiral inductors

Salimy, S., Toutain, S., Rhallabi, A., Goullet, A., Saubat, J.C., Challali, F.

Year:

2009

Language:

english

File:

PDF, 306 KB

english, 2009

7

Simulation of cryogenic silicon etching under SF 6 /O 2 /Ar plasma discharge

Haidar, Yehya, Rhallabi, Ahmed, Pateau, Amand, Mokrani, Arezki, Taher, Fadia, Roqueta, Fabrice, Boufnichel, Mohamed

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 1.18 MB

english, 2016

8

Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells

Landesman, Jean-Pierre, Jiménez, Juan, Levallois, Christophe, Pommereau, Frédéric, Frigeri, Cesare, Torres, Alfredo, Léger, Yoan, Beck, Alexandre, Rhallabi, Ahmed

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 13.32 MB

english, 2016

9

Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties

Le Dain, Guillaume, Rhallabi, Ahmed, Cardinaud, Christophe, Girard, Aurélie, Fernandez, Marie-Claude, Boufnichel, Mohamed, Roqueta, Fabrice

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2018

Language:

english

File:

PDF, 2.90 MB

english, 2018

10

Citrus Psorosis Virus: Current Insights on a Still Poorly Understood Ophiovirus

Belabess, Zineb, Sagouti, Tourya, Rhallabi, Naima, Tahiri, Abdessalem, Massart, SÃ©bastien, Tahzima, Rachid, Lahlali, Rachid, Jijakli, M. Haissam

Journal:

Year:

2020

File:

PDF, 1.70 MB

2020

11

InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

B. Liu, J.-P. Landesman, J.-L. Leclercq, A. Rhallabi, C. Cardinaud, S. Guilet, F. Pommereau, M. Avella, M.A. González, J. Jiménez

Journal:

Materials Science in Semiconductor Processing

Year:

2006

Language:

english

File:

PDF, 167 KB

english, 2006

12

Introduction of defects during the dry etching of InP photonic structures: a cathodo-luminescence study

Manuel Avella, Juan Jiménez, Frédéric Pommereau, Jean-Pieere Landesman, Ahmed Rhallabi

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2008

Language:

english

File:

PDF, 409 KB

english, 2008

13

Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching

R. Chanson, A. Martin, M. Avella, J. Jiménez, F. Pommereau, J. P. Landesman, A. Rhallabi

Journal:

Journal of Electronic Materials

Year:

2010

Language:

english

File:

PDF, 347 KB

english, 2010

14

Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition

G. Marcos, A. Rhallabi, P. Ranson

Journal:

Applied Surface Science

Year:

2008

Language:

english

File:

PDF, 1.23 MB

english, 2008

15

Cathodoluminescence study of inductively coupled plasma (ICP) etched InP waveguide structures: Influence of the ridge dimension and dielectric capping

M. Avella, J. Jiménez, F. Pommereau, J.P. Landesman, A. Rhallabi

Journal:

Materials Science and Engineering: B

Year:

2008

Language:

english

File:

PDF, 452 KB

english, 2008

16

Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma

Lallement, L, Rhallabi, A, Cardinaud, C, Peignon-Fernandez, M C, Alves, L L

Journal:

Plasma Sources Science and Technology

Year:

2009

Language:

english

File:

PDF, 194 KB

english, 2009

17

Global Model of High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP

Chanson, R., Rhallabi, A., Fernandez, M.C., Cardinaud, C., Bouchoule, S., Gatilova, L., Talneau, A.

Journal:

IEEE Transactions on Plasma Science

Year:

2012

Language:

english

File:

PDF, 1.13 MB

english, 2012

18

Complete plasma physics, plasma chemistry, and surface chemistry simulation of SiO2 and Si etching in CF4 plasmas

E. Gogolides, P. Vauvert, A. Rhallabi, G. Turban

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 301 KB

english, 1998

19

High-rate algal pond performances in faecal coliforms and helminth egg removals

B. El Hamouri, K. Khallayoune, K. Bouzoubaa, N. Rhallabi, M. Chalabi

Journal:

Year:

1994

Language:

english

File:

PDF, 358 KB

english, 1994

20

Computer simulation of a carbon-deposition plasma in CH4

Rhallabi, A., Catherine, Y.

Journal:

IEEE Transactions on Plasma Science

Year:

1991

Language:

english

File:

PDF, 812 KB

english, 1991

21

Modeling of inductively coupled plasma Ar/Cl2/N2 plasma discharge: Effect of N2 on the plasma properties

Chanson, Romain, Rhallabi, Ahmed, Fernandez, Marie Claude, Cardinaud, Christophe, Landesman, Jean Pierre

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.25 MB

english, 2013

22

Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon

Mantzaris, Nikolaos V., Gogolides, Evangelos, Boudouvis, Andreas G., Rhallabi, Ahmed, Turban, Guy

Journal:

Journal of Applied Physics

Year:

1996

Language:

english

File:

PDF, 489 KB

english, 1996

23

Modeling of InP Etching Under ICP Cl 2 /Ar/N 2 Plasma Mixture: Effect of N 2 on the Etch Anisotropy Evolution

Chanson, Romain, Rhallabi, Ahmed, Fernandez, Marie Claude, Cardinaud, Christophe

Journal:

Plasma Processes and Polymers

Year:

2013

Language:

english

File:

PDF, 674 KB

english, 2013

24

Radio-frequency glow discharges in methane gas: modelling of the gas-phase physics and chemistry

Gogolides, E, Buteau, C, Rhallabi, A, Turban, G

Journal:

Journal of Physics D Applied Physics

Year:

1994

Language:

english

File:

PDF, 583 KB

english, 1994

25

[IEEE 2014 26th International Conference on Indium Phosphide and Related Materials (IPRM) - Montpellier Cedex, France (2014.5.11-2014.5.15)] 26th International Conference on Indium Phosphide and Related Materials (IPRM) - Composition profiles in InP/InAsP quantum well structures under the effect of reactives gases during dry etching processes — Luminescence and SIMS

Landesman, Jean-Pierre, Jimenez, Juan, Hortelano, Vanesa, Leger, Yoan, Folliot, Herve, Delhaye, Thomas, Torres, Alfredo, Rhallabi, Ahmed

Year:

2014

Language:

english

File:

PDF, 366 KB

english, 2014

26

[IEEE 2006 International Conference on Indium Phosphide and Related Materials - Princeton, NJ (May 7, 2006)] 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings - InP Etching by Chlorine ICP Plasma for Photonic Crystal Applications: Experiments and Simulations

Rhallabi, A., Liu, B., Landesman, J.P., Lecler, J.L.

Year:

2006

Language:

english

File:

PDF, 256 KB

english, 2006

27

[IEEE ESSDERC 2010 - 40th European Solid State Device Research Conference - Sevilla, Spain (2010.09.14-2010.09.16)] 2010 Proceedings of the European Solid State Device Research Conference - Passive components integration in CMOS technology

Salimy, S., Toutain, S., Averty, D., Challali, F., Goullet, A., Besland, M-P, Rhallabi, A., Landesman, J-P., Saubat, J-C, Charpentier, A.

Year:

2010

Language:

english

File:

PDF, 867 KB

english, 2010

28

[IEEE 2006 International Conference on Indium Phosphide and Related Materials - Princeton, NJ (May 7, 2006)] 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings - Cathodoluminescence Characterization of InP based Photonic Structures made by Dry Etching

Avella, M., Pommereau, F., Jimene, J., Landesman, J.P., Liu, B., Rhallabi, A.

Year:

2006

Language:

english

File:

PDF, 392 KB

english, 2006

29

Growth of nodular defects during film deposition

Dubost, Laurent, Rhallabi, Ahmed, Perrin, Jéro^me, Schmitt, Jacques

Journal:

Journal of Applied Physics

Year:

1995

Language:

english

File:

PDF, 1.28 MB

english, 1995

30

Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation

Blauw, M. A., van der Drift, E., Marcos, G., Rhallabi, A.

Journal:

Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 684 KB

english, 2003

31

Development of chemically assisted etching method for GaAs-based optoelectronic devices

M. Gaillard, A. Rhallabi, L. Elmonser, A. Talneau, F. Pommereau, P. Pagnod-rossiaux, N. Bouadma

Year:

2005

Language:

english

File:

PDF, 1.76 MB

english, 2005

32

Investigation of point defect generation in dry etched InP ridge waveguide structures

Avella, M., Jiménez, J., Pommereau, F., Landesman, J. P., Rhallabi, A.

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 478 KB

english, 2007

33

Etching studies of silica glasses in SF[sub 6]/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication

Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M.-C., Rhallabi, A.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2010

Language:

english

File:

PDF, 768 KB

english, 2010

34

Modelling of fluorine based high density plasma for the etching of silica glasses

L. Lallement, A. Rhallabi, C. Cardinaud, M. C. Peignon Fernandez

Year:

2011

Language:

english

File:

PDF, 1.39 MB

english, 2011

35

Monte Carlo simulation method for etching of deep trenches in Si by a SF[sub 6]/O[sub 2] plasma mixture

G. Marcos, A. Rhallabi, P. Ranson

Year:

2003

Language:

english

File:

PDF, 728 KB

english, 2003

36

Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching

Avella, M., Jiménez, J., Pommereau, F., Landesman, J. P., Rhallabi, A.

Journal:

Applied Physics Letters

Year:

2008

Language:

english

File:

PDF, 479 KB

english, 2008

37

Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during CH[sub 4]–H[sub 2] plasma etching

Rhallabi, A., Houlet, L., Turban, G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 727 KB

english, 2000

38

Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl[sub 2]∕Ar[sup +]

Elmonser, L., Rhallabi, A., Gaillard, M., Landesman, J. P., Talneau, Anne, Pommereau, F., Bouadma, N.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2007

Language:

english

File:

PDF, 1.08 MB

english, 2007

39

[IEEE 2006 International Conference on Indium Phosphide and Related Materials - Princeton, NJ (May 7, 2006)] 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings - InP Surface Properties under ICP Plasma Etching using Mixtures of Chlorides and Hydrides

Liu, B., Landesman, J.-P., Leclercq, J.-L., Rhallabi, A., Avella, M., Gonzalez, M.A., Jimenez, J., Guilet, S., Cardinaud, C., Pommereau, F.

Year:

2006

Language:

english

File:

PDF, 301 KB

english, 2006

40

Study of the early stage of SiO[sub 2] growth by a TEOS–O[sub 2] plasma mixture using a three-dimensional Monte Carlo model

Rhallabi, A., Turban, G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2001

Language:

english

File:

PDF, 716 KB

english, 2001

41

[IEEE Related Materials (IPRM) - Versailles, France (2008.05.25-2008.05.29)] 2008 20th International Conference on Indium Phosphide and Related Materials - Defects and mechanical stress during the dry etching of InP photonic structures: A cathodo-luminescence study

Avella, M., Jimenez, J., Pommereau, F., Landesman, J.P., Rhallabi, A.

Year:

2008

Language:

english

File:

PDF, 2.72 MB

english, 2008

42

RF Plasmas in Methane: Prediction of Plasma Properties and Neutral Radical Densities with Combined Gas-Phase Physics and Chemistry Model

Gogolides, Evangelos, Mary, David, Rhallabi, Ahmed, GuyTurban,

Journal:

Japanese Journal of Applied Physics

Year:

1995

File:

PDF, 1.54 MB

1995

43

SF 6 and C 4 F 8 global kinetic models coupled to sheath models

Haidar, Yehya, Pateau, Amand, Rhallabi, Ahmed, Fernandez, Marie Claude, Mokrani, Arezki, Taher, Fadia, Roqueta, Fabrice, Boufnichel, Mohamed

Journal:

Plasma Sources Science and Technology

Year:

2014

Language:

english

File:

PDF, 2.10 MB

english, 2014

44

Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering

Salimy, S., Challali, F., Goullet, A., Besland, M.-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S., Averty, D.

Journal:

ECS Solid State Letters

Year:

2013

Language:

english

File:

PDF, 468 KB

english, 2013

45

Intermixing in InP-Based Quantum Well Photonic Structures Induced by the Dry-Etching Process: A Spectral Imaging Cathodoluminescence Study

Hortelano, Vanessa, Jiménez, Juan, Landesman, Jean Pierre, Rhallabi, Ahmed

Journal:

Materials Science Forum

Year:

2012

Language:

english

File:

PDF, 955 KB

english, 2012

46

Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour

Landesman, J.P., Levallois, C., Jiménez, J., Pommereau, F., Léger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C., Rhallabi, A.

Journal:

Microelectronics Reliability

Year:

2015

Language:

english

File:

PDF, 1012 KB

english, 2015

47

Topographic and kinetic effects of the SF[sub 6]/O[sub 2] rate during a cryogenic etching process of silicon

G. Marcos, A. Rhallabi, P. Ranson

Year:

2004

Language:

english

File:

PDF, 939 KB

english, 2004

48

Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations

A. Rhallabi, M. Gaillard, L. Elmonser, G. Marcos, A. Talneau, F. Pommereau, P. Pagnod-rossiaux, J. P. Landesman, N. Bouadma

Year:

2005

Language:

english

File:

PDF, 1.05 MB

english, 2005

49

X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl2-based inductively coupled plasma

Chanson, Romain, Bouchoule, Sophie, Cardinaud, Christophe, Petit-Etienne, Camille, Cambril, Edmond, Rhallabi, Ahmed, Guilet, Stephane, Blanquet, Elisabeth

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2014

Language:

english

File:

PDF, 1.85 MB

english, 2014

50

Surface chemistry of InP ridge structures etched in Cl2-based plasma analyzed with angular XPS

Bouchoule, Sophie, Chanson, Romain, Pageau, Arnaud, Cambril, Edmond, Guilet, Stephane, Rhallabi, Ahmed, Cardinaud, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2015

Language:

english

File:

PDF, 2.35 MB

english, 2015